Industrial Solutions - Metrology
Industrial Solutions
AMIA Laboratories specializes in the investigation and characterization of materials using the latest advances in x-ray diffraction. We can help you determine if or which x-ray analysis will help in your materials characterization. X-ray analysis is used in the characterization of thin film material properties such as composition, orientation, and stress/strain at the molecular level. X-ray diffraction (XRD) is a definitive non-destructive technique for sub-surface analysis. We offer the highest level of independent laboratory Thin Film Analysis using x-rays and provide a full range of other related Services. Example of x-ray analysis used in the Semiconductor industry are listed below.
Metrology Solutions
?? AMIA Laboratories uses X-ray analysis to characterize thin film material properties such as composition, orientation, and stress/strain at the molecular level. X-ray diffraction (XRD) is the definitive non-destructive technique for sub-surface analysis ??.
Metrology Solutions : Solution 1
?? Crystallographic texture affects electrical and magnetic properties. Pole figures describe the orientation of crystallites in a material. Most electronic thin films exhibit fiber texture, which implies an axially-symmetric pole figure. AMIA Laboratories typically uses fiber texture plots to quantify primary texture strength, % random, and secondary orientations ??.
Metrology Solutions : Solution 2
?? In-plane and out-of-plane stress, and normal micro-strain can influence magnetic properties of thin films and the reliability of devices. Mechanical stresses in interconnect lines, which arise from differences in thermal expansion between the metallic interconnect and the substrate that rigidly confines it, vary with different fabrication methods and aspect ratios. AMIA Laboratories has developed micro-beam stress techniques to characterize features as small as 50 µm on patterned wafers. Blanket film strain measurements are also available ??.
Metrology : Solution 3
?? Unlike conventional X-ray diffraction, reflectometry is a "reflection" experiment in which X-rays are reflected off of the sample at glancing angles in much the same way that visible light is reflected. Film thickness, density and interfacial roughness are obtained from this modeling method ??.
